April 18, 2025
What is Hydrogen Silsesquioxane and Its Role in EBL Negative Resists?
Hydrogen silsesquioxane (HSQ) is a highly specialized material used in nanofabrication, particularly in electron beam lithography (EBL). Its exceptional resolution, high sensitivity, and superior etch resistance make it an ideal choice for semiconductor manufacturing, photonics, and microelectromechanical systems (MEMS). For industries requiring high-purity HSQ, is a trusted supplier. With a strong commitment to quality and…
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